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3923100010 - Photomask or wafer compacts:
-|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties,
-|having non porous, abrasion resistant or impact resistant surface properties,
-|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and
-|with or without a gasket seal,
of a kind used in the photolithography or other semiconductor production to house photomasks or wafersHarmonized System Codes, Taric Code, HS Code, HTS Code, Harmonized Commodity Description, Commodity Codes, Classification of goods, Tariff Nomenclature, Customs Tariff Number, Tariff Classification.